• DocumentCode
    1203961
  • Title

    Analysis of the Kirk effect in silicon-based bipolar transistors with a nonuniform collector profile

  • Author

    Hueting, Raymond J E ; Van der Toorn, Ramses

  • Author_Institution
    Philips Res., Leuven, Belgium
  • Volume
    52
  • Issue
    11
  • fYear
    2005
  • Firstpage
    2489
  • Lastpage
    2495
  • Abstract
    In this paper, the Kirk effect has been analyzed for silicon-based bipolar transistors (BJTs) with a nonuniform collector profile. We show that, for any arbitrary collector doping profile, the Kirk effect starts when the electron concentration equals the average doping concentration in the depletion region. We present a basic guideline for determining the collector current density at the onset of Kirk effect (JK) for any collector doping profile and simple expressions for JK and the electrical field in the collector drift region for the case of a linearly graded collector drift region. These analytical expressions are verified with device simulations. The Kirk effect for this kind of transistor is substantially different from that presented previously for transistors having a uniform collector drift region. For example, the possibility of the onset of the Kirk effect in a partially depleted collector occurs, while in a uniform collector profile the effect can only occur in a fully depleted collector. Our expressions can be used to do approximate analytical calculations for optimizing future BJTs.
  • Keywords
    HF amplifiers; current density; doping profiles; elemental semiconductors; heterojunction bipolar transistors; power semiconductor devices; silicon; BJT; HBT; HF amplifiers; Kirk effect; collector drift region; current density; doping profile; electrical field; electron concentration; heterojunction bipolar transistors; high-frequency amplifiers; nonuniform collector profile; partially depleted collector; power semiconductor devices; silicon compounds; silicon-based bipolar transistor; Analytical models; Bipolar transistors; Current density; Doping profiles; Electrons; Guidelines; Hafnium; Kirk field collapse effect; Silicon; Voltage; Heterojunction bipolar transistors (HBTs); high-frequency (HF) amplifiers; power semiconductor devices; silicon compounds; simulation;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2005.857176
  • Filename
    1522687