• DocumentCode
    1203974
  • Title

    A new high breakdown voltage lateral Schottky collector bipolar transistor on SOI: design and analysis

  • Author

    Kumar, M. Jagadesh ; Roy, Sukhendu Deb

  • Author_Institution
    Dept. of Electr. Eng., Indian Inst. of Technol., New Delhi, India
  • Volume
    52
  • Issue
    11
  • fYear
    2005
  • Firstpage
    2496
  • Lastpage
    2501
  • Abstract
    Using two-dimensional process and device simulation, we present for the first time, a new high breakdown voltage two-zone base extended buried oxide (BOX) lateral Schottky Collector Bipolar Transistor (SCBT) on silicon-on-insulator with a breakdown voltage as high as 12 times that of the conventional lateral Schottky collector bipolar transistor. We have explained the new design features of the proposed Schottky collector structure and the reasons for its significantly improved breakdown performance. The proposed structure is expected to be suitable in the design of the new generation scaled high voltage Schottky collector bipolar transistors for low power high speed analog applications.
  • Keywords
    bipolar transistors; buried layers; electric breakdown; silicon-on-insulator; 2D process; BOX; SCBT; SOI; Schottky collector structure; breakdown voltage; buried oxide; lateral Schottky collector bipolar transistor; silicon-on-insulator; two-zone base; Analytical models; Bipolar transistors; Electric breakdown; Helium; Logic circuits; Power generation; Schottky barriers; Silicon on insulator technology; Switching circuits; Voltage; Breakdown voltage; buried oxide (BOX); lateral Schottky collector bipolar transistor (SCBT); silicon-on-insulator (SOI); two-zone base;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2005.857171
  • Filename
    1522688