DocumentCode
1203974
Title
A new high breakdown voltage lateral Schottky collector bipolar transistor on SOI: design and analysis
Author
Kumar, M. Jagadesh ; Roy, Sukhendu Deb
Author_Institution
Dept. of Electr. Eng., Indian Inst. of Technol., New Delhi, India
Volume
52
Issue
11
fYear
2005
Firstpage
2496
Lastpage
2501
Abstract
Using two-dimensional process and device simulation, we present for the first time, a new high breakdown voltage two-zone base extended buried oxide (BOX) lateral Schottky Collector Bipolar Transistor (SCBT) on silicon-on-insulator with a breakdown voltage as high as 12 times that of the conventional lateral Schottky collector bipolar transistor. We have explained the new design features of the proposed Schottky collector structure and the reasons for its significantly improved breakdown performance. The proposed structure is expected to be suitable in the design of the new generation scaled high voltage Schottky collector bipolar transistors for low power high speed analog applications.
Keywords
bipolar transistors; buried layers; electric breakdown; silicon-on-insulator; 2D process; BOX; SCBT; SOI; Schottky collector structure; breakdown voltage; buried oxide; lateral Schottky collector bipolar transistor; silicon-on-insulator; two-zone base; Analytical models; Bipolar transistors; Electric breakdown; Helium; Logic circuits; Power generation; Schottky barriers; Silicon on insulator technology; Switching circuits; Voltage; Breakdown voltage; buried oxide (BOX); lateral Schottky collector bipolar transistor (SCBT); silicon-on-insulator (SOI); two-zone base;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2005.857171
Filename
1522688
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