Title :
Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology
Author :
Bogaerts, W. ; Baets, R. ; Dumon, P. ; Wiaux, V. ; Beckx, S. ; Taillaert, D. ; Luyssaert, B. ; Van Campenhout, J. ; Bienstman, P. ; Van Thourhout, D.
Author_Institution :
Dept. of Inf. Technol., Ghent Univ., Gent, Belgium
Abstract :
High-index-contrast, wavelength-scale structures are key to ultracompact integration of photonic integrated circuits. The fabrication of these nanophotonic structures in silicon-on-insulator using complementary metal-oxide-semiconductor processing techniques, including deep ultraviolet lithography, was studied. It is concluded that this technology is capable of commercially manufacturing nanophotonic integrated circuits. The possibilities of photonic wires and photonic-crystal waveguides for photonic integration are compared. It is shown that, with similar fabrication techniques, photonic wires perform at least an order of magnitude better than photonic-crystal waveguides with respect to propagation losses. Measurements indicate propagation losses as low as 0.24 dB/mm for photonic wires but 7.5 dB/mm for photonic-crystal waveguides.
Keywords :
CMOS integrated circuits; nanolithography; nanowires; optical fabrication; optical losses; optical waveguides; photonic crystals; silicon-on-insulator; ultraviolet lithography; CMOS; complementary metal-oxide-semiconductor processing; deep ultraviolet lithography; nanophotonic waveguide fabrication; photonic integrated circuits; photonic wires; photonic-crystal waveguides; propagation losses; silicon-on-insulator; CMOS technology; Fabrication; Integrated circuit manufacture; Integrated circuit technology; Lithography; Nanostructures; Photonic integrated circuits; Propagation losses; Silicon on insulator technology; Wires; Nanophotonics; photonic crystal; silicon-on-insulator (SOI); waveguides;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2004.834471
