• DocumentCode
    1204897
  • Title

    A 0.7 V Single-Supply SRAM With 0.495 \\mu m ^{2} Cell in 65 nm Technology Utilizing Self-Write-B

  • Author

    Kushida, Keiichi ; Suzuki, Azuma ; Fukano, Gou ; Kawasumi, Atsushi ; Hirabayashi, Osamu ; Takeyama, Yasuhisa ; Sasaki, Takahiko ; Katayama, Akira ; Fujimura, Yuki ; Yabe, Tomoaki

  • Author_Institution
    Center for Semicond. Res. & Dev., Toshiba Corp., Kawasaki
  • Volume
    44
  • Issue
    4
  • fYear
    2009
  • fDate
    4/1/2009 12:00:00 AM
  • Firstpage
    1192
  • Lastpage
    1198
  • Abstract
    We proposed a novel SRAM architecture with a high-density cell in low-supply-voltage operation. A self-write-back sense amplifier realizes cell failure rate improvement by more than two orders of magnitude at 0.6 V. A cascaded bit line scheme saves additional process cost for hierarchical bit line layer. A test chip with 256 kb SRAM utilizing 0.495 mum2 cell in 65 nm CMOS technology demonstrated 0.7 V single-supply operation.
  • Keywords
    CMOS digital integrated circuits; SRAM chips; amplifiers; integrated circuit design; low-power electronics; nanoelectronics; CMOS technology; SRAM; cascaded bit line scheme; high-density cell; low-supply-voltage; memory size 256 KByte; self-write-back sense amplifier; single-supply operation; size 65 nm; voltage 0.6 V; voltage 0.7 V; CMOS technology; Costs; Logic circuits; Operational amplifiers; Parasitic capacitance; Power supplies; Random access memory; Stability; Testing; Voltage; Low-power design; SRAM; divided bit line; ultra-high-density cell;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.2009.2014009
  • Filename
    4804974