Surface texturing for Maxwell-Wagner polarisation engineering

Surface texturing techniques that are applied in laminar structures to extend the supported Maxwell-Wagner polarisation are described. The roughness of the semiconductor surface is increased, resulting in a subdivision of the large Si-SiO₂ interfaces to a multitude of small interfaces. Measured results demonstrate that this surface texturing has a direct effect on the relaxation of the Maxwell-Wagner polarisation and, in particular, at the interfacial to atomic polarisation transition.