DocumentCode :
1206038
Title :
Process flow improvement on a bulk micromachined gyroscope
Author :
Zheng, Xiaoquan ; Jin, Z. ; Wang, Yannan ; Zhang, Xiaobing ; Hu, Song ; Xu, Lie
Author_Institution :
Dept. of Inf. Sci. & Electron. Eng., Zhejiang Univ., Hangzhou
Volume :
4
Issue :
1
fYear :
2009
fDate :
3/1/2009 12:00:00 AM
Firstpage :
34
Lastpage :
38
Abstract :
An introduction of a bulk micromachined frame gyroscope and the efforts made to lower the footing effect during deep reactive ion etching (DRIE) is featured. The gyroscope is driven into oscillation electrostatically and senses rate signal by the varying overlapped area of the electrodes, which eliminates the nonlinear behaviour of sensing the varying gap. Damping factors for the driving and sensing modes are low due to the slide-film damping, resulting in high quality factors in the atmosphere. A large proofmass can be made by DRIE, which also ensures a large pull-in voltage. The footing effect during fabrication has been greatly reduced by the improved process flow, which also increases the proof mass by 50%. Thus device quality and yield rate are both improved. Functional results of an improved prototype are given.
Keywords :
damping; gyroscopes; micromachining; microsensors; sputter etching; bulk micromachined gyroscope; damping factor; deep reactive ion etching; electrostatic oscillation; nonlinear behaviour; process flow improvement; quality factor; slide-film damping;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl:20080052
Filename :
4805247
Link To Document :
بازگشت