• DocumentCode
    1206665
  • Title

    Equivalent circuit model of on-wafer CMOS interconnects for RFICs

  • Author

    Shi, Xiaomeng ; Ma, Jian-Guo ; Yeo, Kiat Seng ; Do, Manh Anh ; Li, Erping

  • Author_Institution
    Center for Integrated Circuits & Syst., Nanyang Technol. Univ., Singapore
  • Volume
    13
  • Issue
    9
  • fYear
    2005
  • Firstpage
    1060
  • Lastpage
    1071
  • Abstract
    This paper investigates the properties of the on-wafer interconnects built in a 0.18-/spl mu/m CMOS technology for RF applications. A scalable equivalent circuit model is developed. The model parameters are extracted directly from the on-wafer measurements and formulated into empirical expressions. The expressions are in functions of the length and the width of the interconnects. The proposed model can be easily implemented into commercial RF circuit simulators. It provides a novel solution to include the frequency-variant characteristics into a circuit simulation. The silicon-verified accuracy is proved to be up to 25 GHz with an average error less than 2%. Additionally, equivalent circuit model for longer wires can be obtained by cascading smaller subsections together. The scalability of the propose model is demonstrated.
  • Keywords
    CMOS integrated circuits; S-parameters; circuit simulation; equivalent circuits; integrated circuit interconnections; integrated circuit modelling; radiofrequency integrated circuits; 0.18 micron; RF CMOS interconnects; RFIC; circuit simulation; lumped equivalent circuit model; on-wafer measurements; scattering parameters measurement; skin effect; substrate losses; CMOS technology; Circuit simulation; Consumer electronics; Design automation; Equivalent circuits; Integrated circuit interconnections; Integrated circuit technology; Radio frequency; Radiofrequency integrated circuits; Semiconductor device modeling; Empirical formulas; RF CMOS interconnects; lumped equivalent circuit model; modeling; scalable; scattering parameters measurement; skin effect; substrate losses;
  • fLanguage
    English
  • Journal_Title
    Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1063-8210
  • Type

    jour

  • DOI
    10.1109/TVLSI.2005.857177
  • Filename
    1525038