• DocumentCode
    1208104
  • Title

    Inverter performance of 0.10 μm CMOS operating at room temperature

  • Author

    Inaba, Satoshi ; Mizuno, Tomohisa ; Iwase, Masao ; Takahashi, Minoru ; Niiyama, Hiromi ; Hazama, Hiroaki ; Yoshimi, Makoto ; Toriumi, Akira

  • Author_Institution
    Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
  • Volume
    41
  • Issue
    12
  • fYear
    1994
  • fDate
    12/1/1994 12:00:00 AM
  • Firstpage
    2399
  • Lastpage
    2404
  • Abstract
    The switching performance of 0.10 μm CMOS devices operating at room temperature has been discussed on the basis of both experimental and simulated results. The measured propagation delay time of a 0.10 μm gate length CMOS has been quantitatively divided into intrinsic and parasitic components for the first time. The results have shown that the drain junction capacitance strongly affects the propagation delay time in the present 0.10 μm CMOS. The switching performance of a 0.10 μm ground rule CMOS has been simulated by using device parameters extracted from the experimental results. In the 0.10 μm ground rule CMOS, it has been shown that an increase of the contact resistance will degrade the propagation delay time, which is one of the most essential problems in further device miniaturization. It has been also demonstrated that even if the specific contact resistance ρc is reduced to be less than 1×10-7 Ω cm, further reduction of the gate overlap capacitance Cov will be required to achieve the propagation delay time to be less than 10 ps in the 0.10 μm ground rule CMOS at room temperature
  • Keywords
    CMOS digital integrated circuits; capacitance; contact resistance; delays; switching; 0.1 micron; 10 ps; CMOS devices; contact resistance; drain junction capacitance; gate overlap capacitance; inverter performance; propagation delay time; room temperature operation; switching performance; Contact resistance; Degradation; Inverters; Land surface temperature; Length measurement; MOSFET circuits; Nitrogen; Parasitic capacitance; Propagation delay; Time measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.337455
  • Filename
    337455