Title :
The yield enhancement methodology for invisible defects using the MTS+ method
Author :
Riho, Taketoshi ; Suzuki, Akihito ; Oro, Junji ; Ohmi, Kenji ; Tanaka, Hajime
Author_Institution :
Quality Eng. Sect., Sanyo Electron. Co. Ltd., Gifu, Japan
Abstract :
Whenever we try to enhance the production yield, we have problems identifying the cause of invisible defects over the entire process, even more so for charge-coupled devices (CCD). This time, we utilized the Mahalanobis Taguchi System (MTS) method with several original techniques to identify the cause of failure in the wafer process. We calculated the historical data of CCDs process parameter and took several countermeasures. According to the results, we learned that the invisible defects corresponded to the contamination of organic matter and the front-end process´s sensitivity.
Keywords :
Taguchi methods; charge-coupled devices; failure analysis; semiconductor device manufacture; semiconductor device reliability; semiconductor technology; MTS+ method; Mahalanobis Taguchi System; Mahalanobis distance; charge-coupled devices; failure analysis; invisible defects; production yield enhancement methodology; semiconductor device manufacture; semiconductor technology; wafer process failures; Charge coupled devices; Contamination; Costs; Data analysis; Data mining; Failure analysis; Impurities; Multidimensional systems; Production; Semiconductor device manufacture; Charge-coupled devices (CCD); Mahalanobis distance; failure analysis; multidimensional data analysis; orthogonal array; process diagnosis; semiconductor defects; semiconductor device manufacture;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2005.858499
