DocumentCode :
1211929
Title :
CMOS voltage reference based on gate work function differences in poly-Si controlled by conductivity type and impurity concentration
Author :
Watanabe, Hirobumi ; Ando, Shunsuke ; Aota, Hideyuki ; Dainin, Masanori ; Chun, Yong-Jin ; Taniguchi, Kenji
Author_Institution :
Electron. Devices Co., Ricoh Co. Ltd., Osaka, Japan
Volume :
38
Issue :
6
fYear :
2003
fDate :
6/1/2003 12:00:00 AM
Firstpage :
987
Lastpage :
994
Abstract :
A new CMOS voltage reference circuit consisting of two pairs of transistors is presented. One pair exhibits a threshold voltage difference with a negative temperature coefficient (-0.49 mV/°C), while the other exhibits a positive temperature coefficient (+0.17 mV/°C). The circuit was robust to process variations and exhibited excellent temperature independence and stable output voltage. Aside from conductivity type and impurity concentrations of gate electrodes, transistors in the pairs were identical, meaning that the system was robust with respect to process fluctuations. Measurements of the voltage reference circuit without trimming adjustments revealed that it had excellent output voltage reproducibility of within ±2%, low temperature coefficient of less than 80 ppm/°C, and low current consumption of 0.6 μA.
Keywords :
CMOS analogue integrated circuits; elemental semiconductors; impurity distribution; reference circuits; silicon; 0.6 muA; CMOS voltage reference circuit; Si; gate electrode conductivity type; gate electrode impurity concentration; gate work function differences; negative temperature coefficient; polysilicon; positive temperature coefficient; stable output voltage; temperature independence; Circuits; Conductivity; Current measurement; Electrodes; Fluctuations; Impurities; Robustness; Temperature; Threshold voltage; Voltage control;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2003.811974
Filename :
1202001
Link To Document :
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