Title :
3D Nanofocusing plasmonic waveguide
Author_Institution :
California Institute of of Technol., Pasadena, CA, USA
Abstract :
We have demonstrated experimentally a highly efficient on-chip three-dimensional (3D) linearly tapered metal-insulator-metal (MIM) nanoplasmonic photon compressor (3D NPC) with a final aperture size of 14 × 80 nm2. An optimized and linearly tapered MIM gap plasmon waveguide could theoretically reduce the excessive losses that would occur during nanofocusing processes. In simulation study, this approach could enable nanofocusing into a 2 × 5 nm2 area with the coupling loss and maximum E2 enhancement of 2.5 dB and 3.0 × 104, respectively. We fabricated the 3D NPC on a chip employing electron beam-induced deposition and demonstrated its highly localized light confinement using a two-photon photoluminescence (TPPL) technique. From the TPPL measurements, we experimentally estimated an intensity enhancement of 400 within a 14 × 80 nm2 cross-sectional area and a coupling efficiency of -1.3 dB (or 74% transmittance).
Keywords :
electron beam deposition; nanophotonics; optical focusing; optical waveguides; photoluminescence; plasmonics; 3D nanofocusing plasmonic waveguide; coupling loss; electron beam-induced deposition; linearly tapered MIM gap plasmon waveguide; metal-insulator-metal nanoplasmonic photon compressor; nanofocusing processes; two-photon photoluminescence; Nanoscale devices; Optical device fabrication; Optical surface waves; Optical waveguides; Plasmons; System-on-chip; Three-dimensional displays;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2014 International Conference on
Conference_Location :
Glasgow
Print_ISBN :
978-0-9928-4140-9
DOI :
10.1109/OMN.2014.6924523