• DocumentCode
    1213351
  • Title

    Micromagnetics of laminated Permalloy films

  • Author

    Slonczewski, John C. ; Petek, Bojan ; Argyle, Bernell E.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    24
  • Issue
    3
  • fYear
    1988
  • fDate
    5/1/1988 12:00:00 AM
  • Firstpage
    2045
  • Lastpage
    2054
  • Abstract
    The edge curling wall (ECW) is observed in an optical Kerr microscope. Conditions are derived energetically favoring single transverse domains with ECWs over other multiple closure domains or single longitudinal domains that are undesirable because of their low permeability. Computed figures illustrate how the maximum permissible spacer thickness depends on Permalloy sublayer thickness, uniaxial anisotropy, width of the magnetic strip, mismatch of Permalloy thickness, and perpendicular anisotropy. The case with strip width W=100 mu m and vanishing magnetostriction or stress should require only a few sublayers. However, if W is very small, or if stress-induced or some other form of perpendicular anisotropy is excessive, then attainment of single transversely magnetized domains requires many sublayers. Some of these conclusions are supported by microscopic observations.
  • Keywords
    Kerr magneto-optical effect; Permalloy; ferromagnetic properties of substances; magnetic domain walls; magnetic domains; magnetic thin films; edge curling wall; ferromagnet; laminated Permalloy films; magnetic strip thickness; micromagnetics; mismatch; multiple closure domains; optical Kerr microscope; permissible spacer thickness; perpendicular anisotropy; single longitudinal domains; single transverse domains; uniaxial anisotropy; Anisotropic magnetoresistance; Geometrical optics; Magnetic domains; Magnetostriction; Micromagnetics; Optical films; Optical microscopy; Permeability; Stress; Strips;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.3399
  • Filename
    3399