DocumentCode :
1213445
Title :
Noise in Silicon Nanowires
Author :
Reza, Shahed ; Bosman, Gijs ; Islam, M. Saif ; Kamins, Theodore I. ; Sharma, Shashank ; Williams, R.Stanley
Author_Institution :
Florida Univ., Gainesville, FL
Volume :
5
Issue :
5
fYear :
2006
Firstpage :
523
Lastpage :
529
Abstract :
The current-voltage and noise characteristics of bridging silicon wires have been measured at room temperature. From the linear current-voltage characteristics the bulk and contact resistance contributions are extracted and modeled. The excess noise observed at low frequencies is interpreted in terms of bulk and contact noise contributions, with the former comparable, in terms of Hooge parameter values, to the low noise levels observed in high-quality silicon devices. The contact noise is significant in some devices and is attributed to the impinging end of the bridging nanowires
Keywords :
1/f noise; contact resistance; elemental semiconductors; nanoelectronics; nanowires; semiconductor device models; semiconductor device noise; silicon; 1/f noise; 293 to 298 K; Hooge parameter values; Si; contact noise; contact resistance; current-voltage characteristics; noise characteristics; room temperature; silicon nanowires; Current measurement; Current-voltage characteristics; Electrical resistance measurement; Low-frequency noise; Nanowires; Noise level; Noise measurement; Silicon; Temperature measurement; Wires; Carbon nanotube; contact noise; nanowire; noise;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2006.880908
Filename :
1695951
Link To Document :
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