Title :
Patterned nanostructure lasers by MOCVD
Author_Institution :
Univ. of Illinois, Urbana, IL, USA
Abstract :
Metalorganic chemical vapor deposition (MOCVD) has been the epitaxial growth method of choice for lasers and other photonic devices for nearly forty years. Here we very briefly review selected aspects of MOCVD selective area epitaxy (SAE) and nanostructure self-assembly, to patterned nano-structure growth.
Keywords :
MOCVD; nanophotonics; quantum dot lasers; vapour phase epitaxial growth; MOCVD; epitaxial growth method; metalorganic chemical vapor deposition; nanostructure growth; nanostructure self-assembly; patterned nanostructure lasers; photonic devices; selective area epitaxy; Micromechanical devices; Nanophotonics;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2014 International Conference on
Conference_Location :
Glasgow
Print_ISBN :
978-0-9928-4140-9
DOI :
10.1109/OMN.2014.6924603
