• DocumentCode
    1213568
  • Title

    Very high voltage operation (>330 V) with high current gain of AlGaN/GaN HBTs

  • Author

    Huili Xing ; Chavarkar, P.M. ; Keller, S. ; DenBaars, S.P. ; Mishra, U.K.

  • Author_Institution
    Electr. & Comput. Eng. Dept., Univ. of California, Santa Barbara, CA, USA
  • Volume
    24
  • Issue
    3
  • fYear
    2003
  • fDate
    3/1/2003 12:00:00 AM
  • Firstpage
    141
  • Lastpage
    143
  • Abstract
    N-p-n Al/sub 0.05/GaN/GaN heterojunction bipolar transistors with a common emitter operation voltage higher than 330 V have been demonstrated using selectively regrown emitters. Devices were grown by metalorganic chemical vapor deposition on sapphire substrates. The n-type emitter was grown selectively on a 100-nm-thick p-base with an 8 μm n-collector structure using a dielectric mask. The shallow etch down to the collector mitigates damages induced in the dry etch, resulting a low leakage and a high breakdown. The graded AlGaN emitter results in a common emitter current gain of /spl sim/18 at an average collector current density of up to 1 kA/cm2 at room temperature.
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; current density; gallium compounds; heterojunction bipolar transistors; power bipolar transistors; sapphire; semiconductor device breakdown; wide band gap semiconductors; 100 nm; 330 V; 8 micron; Al/sub 0.05/GaN-GaN; Al/sub 2/O/sub 3/; AlGaN/GaN HBTs; Gummel plot; HV operation; MOCVD; common emitter operation voltage; graded AlGaN emitter; heterojunction bipolar transistors; high breakdown; high current gain; high voltage operation; low leakage; metalorganic chemical vapor deposition; n-type emitter; sapphire substrates; selectively regrown emitters; shallow etch; Aluminum gallium nitride; Chemical vapor deposition; Current density; Dielectric substrates; Dry etching; Electric breakdown; Gallium nitride; Heterojunction bipolar transistors; Temperature; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2003.811400
  • Filename
    1202507