DocumentCode
1213960
Title
Attenuation mechanisms of aluminum millimeter-wave coplanar waveguides on silicon
Author
Schöllhorn, Claus ; Zhao, Weiwei ; Morschbach, Michael ; Kasper, Erich
Author_Institution
Inst. fur Halbleitertechnik, Stuttgart Univ., Germany
Volume
50
Issue
3
fYear
2003
fDate
3/1/2003 12:00:00 AM
Firstpage
740
Lastpage
746
Abstract
The loss mechanisms of silicon coplanar waveguides (CPW) with aluminum metallization are investigated up to 40 GHz. Three main parts contribute to the attenuation of coplanar waveguides (CPWs): the frequency-dependent conductor losses of the metallization, frequency-independent substrate losses, and the specifically investigated bias-dependent interface losses caused by free charges at the Si-SiO2 interface. The minimum losses found in 50-Ω CPWs with 45-μm signal line width were 0.19 db/mm at 10 GHz and 0.33 dB/mm at 40 GHz. High-purity silicon from a float zone (FZ) process was used as substrate. Substrates with lower purity from a Czochralski (CZ) process (resistivity 50-100 Ωcm) resulted in somewhat higher (0.2-0.3 dB/mm) losses for the same CPW geometry.
Keywords
MIMIC; aluminium; coplanar waveguides; equivalent circuits; integrated circuit metallisation; losses; semiconductor-insulator boundaries; silicon; 10 to 40 GHz; 45 micron; 50 to 100 ohmcm; Al MM-wave CPWs; Al metallization; Czochralski process; Si MIMICs; Si coplanar waveguides; Si-SiO2 interface; Si-SiO2-Al; bias-dependent interface losses; float zone process; frequency-dependent conductor losses; frequency-independent substrate losses; loss mechanisms; Aluminum; Attenuation; Conductivity; Conductors; Coplanar waveguides; Frequency; Geometry; Metallization; Silicon; Waveguide components;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2003.810466
Filename
1202605
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