• DocumentCode
    1213960
  • Title

    Attenuation mechanisms of aluminum millimeter-wave coplanar waveguides on silicon

  • Author

    Schöllhorn, Claus ; Zhao, Weiwei ; Morschbach, Michael ; Kasper, Erich

  • Author_Institution
    Inst. fur Halbleitertechnik, Stuttgart Univ., Germany
  • Volume
    50
  • Issue
    3
  • fYear
    2003
  • fDate
    3/1/2003 12:00:00 AM
  • Firstpage
    740
  • Lastpage
    746
  • Abstract
    The loss mechanisms of silicon coplanar waveguides (CPW) with aluminum metallization are investigated up to 40 GHz. Three main parts contribute to the attenuation of coplanar waveguides (CPWs): the frequency-dependent conductor losses of the metallization, frequency-independent substrate losses, and the specifically investigated bias-dependent interface losses caused by free charges at the Si-SiO2 interface. The minimum losses found in 50-Ω CPWs with 45-μm signal line width were 0.19 db/mm at 10 GHz and 0.33 dB/mm at 40 GHz. High-purity silicon from a float zone (FZ) process was used as substrate. Substrates with lower purity from a Czochralski (CZ) process (resistivity 50-100 Ωcm) resulted in somewhat higher (0.2-0.3 dB/mm) losses for the same CPW geometry.
  • Keywords
    MIMIC; aluminium; coplanar waveguides; equivalent circuits; integrated circuit metallisation; losses; semiconductor-insulator boundaries; silicon; 10 to 40 GHz; 45 micron; 50 to 100 ohmcm; Al MM-wave CPWs; Al metallization; Czochralski process; Si MIMICs; Si coplanar waveguides; Si-SiO2 interface; Si-SiO2-Al; bias-dependent interface losses; float zone process; frequency-dependent conductor losses; frequency-independent substrate losses; loss mechanisms; Aluminum; Attenuation; Conductivity; Conductors; Coplanar waveguides; Frequency; Geometry; Metallization; Silicon; Waveguide components;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.810466
  • Filename
    1202605