DocumentCode :
1213982
Title :
Observation of explosive spectral behaviors in proton-enhanced high-Q inductors and their explanations
Author :
Liao, Chungpin ; Liu, Chih-Wei ; Hsu, Yu-Min
Author_Institution :
Adv. Res. & Bus. Lab., Taichung, Taiwan
Volume :
50
Issue :
3
fYear :
2003
fDate :
3/1/2003 12:00:00 AM
Firstpage :
758
Lastpage :
763
Abstract :
The verified success of proton-beam treatment in both device isolation and inductor Q-improvement on Si substrates is now enticing some big chipmakers into realizing a VLSI back-end facility: the particle-beam stand (PBS). The PBS can potentially end the traditionally laborious mixed-mode product development cycle and eventually become the general system-on-a-chip (SOC) integration platform. However, the observed Q-improvement might in fact fall short of what it should be. Namely, if substrate resistivity is the sole dominant factor deciding the ultimate inductor Q value, then the proton-achieved resistivity does not bring forth the anticipated ideal Q value. Furthermore, there are several puzzles in the observed inductance spectral behaviors. Thus, there is an explosive rise of inductance near certain frequencies in some cases but not in others, and the inductor size effect alters the frequency at which these inductance rises occur. Such difficulties outwit the existing understanding of the microstrip inductors. A new theory is briefly presented here to unravel the cause of such incomplete Q-improvement and hopefully to resolve all related puzzles. It includes identifying the inductor-substrate coupling effect as a result of the proton bombardment, using a special dipole-dominated expansion of the inductor system equations, and further applying the notion of electromagnetic mass of the electron. With such theoretical insight, ideal high-Q passives may be just a few steps away using the so-called "dipole engineering" approach on PBS.
Keywords :
Q-factor; inductance; inductors; microstrip components; proton effects; radiofrequency integrated circuits; size effect; system-on-chip; Si substrates; VLSI back-end facility; device isolation; dipole engineering approach; dipole-dominated expansion; electromagnetic mass of electron; explosive spectral behaviors; ideal high-Q passives; inductance spectral behavior; inductor Q-improvement; inductor size effect; inductor-substrate coupling; microstrip inductors; mixed-mode product development cycle; particle-beam stand; proton bombardment; proton-achieved resistivity; proton-enhanced high-Q inductors; substrate resistivity; system-on-a-chip integration platform; Conductivity; Electromagnetic coupling; Explosives; Frequency; Inductance; Inductors; Microstrip; Product development; System-on-a-chip; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.810475
Filename :
1202612
Link To Document :
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