DocumentCode :
1214513
Title :
How do hot carriers degrade n-channel MOSFETs?
Author :
Mistry, Kaizad ; Doyle, Brian
Author_Institution :
Digital Equipment Corp., Hudson, MA, USA
Volume :
11
Issue :
1
fYear :
1995
fDate :
1/1/1995 12:00:00 AM
Firstpage :
28
Lastpage :
33
Abstract :
Explores the mechanisms of hot carrier degradation in n-MOSFETs. In addressing the problem of hot carrier degradation, we examine the carrier injection process, whereby electrons and holes are injected into the oxide from the channel. Next, we´ll look at the processes responsible for creating damage. Third, the impact of the damage on the MOSFET´s terminal characteristics is deternined. Then the damage process is modeled. Finally, we´ll address ways to reduce hot carrier degradation
Keywords :
MOSFET; hot carriers; semiconductor device models; semiconductor device reliability; N-channel MOSFETs; carrier injection process; damage process; hot carrier degradation; hot carriers; terminal characteristics; Acceleration; Charge carrier processes; Current measurement; Degradation; Electrons; Hot carriers; Impact ionization; Low voltage; MOSFET circuits; Switches;
fLanguage :
English
Journal_Title :
Circuits and Devices Magazine, IEEE
Publisher :
ieee
ISSN :
8755-3996
Type :
jour
DOI :
10.1109/101.340310
Filename :
340310
Link To Document :
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