• DocumentCode
    1216386
  • Title

    Phase modulation efficiency and transmission loss of silicon optical phase shifters

  • Author

    Liao, Ling ; Liu, Ansheng ; Jones, Richard ; Rubin, Doron ; Samara-Rubio, Dean ; Cohen, Oded ; Salib, Michael ; Paniccia, Mario

  • Author_Institution
    Intel Corp., Santa Clara, CA, USA
  • Volume
    41
  • Issue
    2
  • fYear
    2005
  • Firstpage
    250
  • Lastpage
    257
  • Abstract
    This paper focuses on understanding the phase efficiency and optical loss of MOS-capacitor-based silicon waveguide phase shifters. A total of nine designs have been fabricated using poly-silicon and characterized at wavelengths around 1.55 μm. Detailed comparison of design parameters shows that scaling down the waveguide dimensions, placing the capacitor gate oxide near the center of the optical mode, and reducing the oxide thickness significantly enhance phase modulation efficiency. Our best design to date demonstrates a π-radian phase shift with 0.8-cm device length and 3-V drive. This phase shifter has a transmission loss of 15 dB, the primary source of which is the poly-silicon regions inside the device. An improved material can reduce loss to as little as 4 dB.
  • Keywords
    MOS capacitors; elemental semiconductors; optical design techniques; optical fabrication; optical losses; optical modulation; optical phase shifters; optical waveguides; phase modulation; silicon; MOS capacitor; Si; phase modulation efficiency; silicon waveguide phase shifters; transmission loss; Nonlinear optics; Optical losses; Optical modulation; Optical refraction; Optical variables control; Optical waveguides; Phase modulation; Phase shifters; Propagation losses; Silicon;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.2004.840079
  • Filename
    1386483