DocumentCode
1216386
Title
Phase modulation efficiency and transmission loss of silicon optical phase shifters
Author
Liao, Ling ; Liu, Ansheng ; Jones, Richard ; Rubin, Doron ; Samara-Rubio, Dean ; Cohen, Oded ; Salib, Michael ; Paniccia, Mario
Author_Institution
Intel Corp., Santa Clara, CA, USA
Volume
41
Issue
2
fYear
2005
Firstpage
250
Lastpage
257
Abstract
This paper focuses on understanding the phase efficiency and optical loss of MOS-capacitor-based silicon waveguide phase shifters. A total of nine designs have been fabricated using poly-silicon and characterized at wavelengths around 1.55 μm. Detailed comparison of design parameters shows that scaling down the waveguide dimensions, placing the capacitor gate oxide near the center of the optical mode, and reducing the oxide thickness significantly enhance phase modulation efficiency. Our best design to date demonstrates a π-radian phase shift with 0.8-cm device length and 3-V drive. This phase shifter has a transmission loss of 15 dB, the primary source of which is the poly-silicon regions inside the device. An improved material can reduce loss to as little as 4 dB.
Keywords
MOS capacitors; elemental semiconductors; optical design techniques; optical fabrication; optical losses; optical modulation; optical phase shifters; optical waveguides; phase modulation; silicon; MOS capacitor; Si; phase modulation efficiency; silicon waveguide phase shifters; transmission loss; Nonlinear optics; Optical losses; Optical modulation; Optical refraction; Optical variables control; Optical waveguides; Phase modulation; Phase shifters; Propagation losses; Silicon;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.2004.840079
Filename
1386483
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