DocumentCode :
1216695
Title :
Numerical Simulation of the Flow, Temperature, and Concentration Fields in a Radio Frequency Plasma CVD Reactor
Author :
Guo-Ying, Zhao ; Ching-Wen, Zhu
Volume :
14
Issue :
4
fYear :
1986
Firstpage :
531
Lastpage :
537
Abstract :
A mathematical model is presented for the numerical simulation of the flow in a radio frequency (RF) plasma chemical, vapor, and deposition (CVD) reactor. The main parts include a plasma torch (2.5 cm in radius, 22.5 cm long), a reactor (2.5 cm in radius, 20.0 cm long), and a powder collector (4.0 cm in radius, 20 cm long) with a water-cooling tank at the center. The model is based on the solution of two-dimensional continuity, momentum, energy, and species equations in cylindrical coordinates simultaneously with the one-dimensional magnetic and electric-field equations. Detailed knowledge about the velocity, species distributions, and temperature field (both in the flow and in the wall which confines the flow) is obtained by the numerical method SIMPLER of Patankar and Spalding. The effect of some important parameters such as side injection slit width and swirl velocity are investigated. Calculation is made under atmospheric pressure at a power level of 8.4 kW with argon as a heating gas and SiCl4, NH3, H2 as reactants. Owing to the lack of related reaction rate, the chemical reaction and crystallization are not taken into account. Some comments on the flow field in the reactor are made.
Keywords :
Chemical vapor deposition; Equations; Inductors; Magnetic confinement; Mathematical model; Numerical simulation; Plasma chemistry; Plasma simulation; Plasma temperature; Radio frequency;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.1986.4316585
Filename :
4316585
Link To Document :
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