DocumentCode :
1217409
Title :
On the operation configuration of SiGe HBTs based on power gain analysis
Author :
Ma, Zhenqiang ; Jiang, Ningyue
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Wisconsin, Madison, WI, USA
Volume :
52
Issue :
2
fYear :
2005
Firstpage :
248
Lastpage :
255
Abstract :
The power gain difference, under different device stability conditions, between common-emitter (CE) and common-base (CB) bipolar junction transistors (BJT) is analyzed comprehensively. The analysis reveals that the CB configuration offers higher maximum available power gain than the CE configuration in the device´s high operation frequency range, while the inverse relation holds in the very low frequency range. In the intermediate frequency range, the base resistance value, mainly affected by the base doping concentration, determines which configuration offers higher maximum stable power gain (MSG). These analyses have explicit implications on the operation configurations of SiGe heterojunction bipolar transistors (HBTs). Employing a typical doping profile of Si bipolar junction transistors with a trapezoidal Ge profile in SiGe HBTs usually results in a larger base resistance than the emitter resistance. For these devices, the CE configuration exhibits higher MSG than the CB configuration. Employing a higher base doping concentration than the emitter with a box-type Ge profile considerably reduces the base resistance and thus favors the CB configuration for power amplification in this frequency range. The analysis are quantitatively verified with simulation and measurement results from SiGe HBTs of representative Ge and base doping profiles.
Keywords :
Ge-Si alloys; doping profiles; heterojunction bipolar transistors; power bipolar transistors; 2D simulation; SiGe; SiGe HBT; base doping concentration; base resistance; box-type Ge profile; common-base bipolar junction transistors; common-emitter bipolar junction transistors; device stability; doping profile; emitter resistance; heterojunction bipolar transistors; intermediate frequency range; maximum stable power gain; operation configuration; power amplification; power gain analysis; Analytical models; Doping profiles; Electrical resistance measurement; Germanium silicon alloys; Heterojunction bipolar transistors; Microwave devices; Radio frequency; Silicon germanium; Stability analysis; Two dimensional displays;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2004.842541
Filename :
1386594
Link To Document :
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