DocumentCode :
1217424
Title :
Surface topography evolution and fatigue fracture in polysilicon MEMS structures
Author :
Allameh, Seyed M. ; Shrotriya, Pranav ; Butterwick, Alex ; Brown, Stuart B. ; Soboyejo, Wole O.
Author_Institution :
Dept. of Mech. & Aerosp. Eng., The Princeton Mater. Inst., NJ, USA
Volume :
12
Issue :
3
fYear :
2003
fDate :
6/1/2003 12:00:00 AM
Firstpage :
313
Lastpage :
324
Abstract :
This paper presents the results of an experimental study of the micromechanisms of surface topography evolution and fatigue fracture in polysilicon MEMS structures. The initial stages of fatigue are shown to be associated with stress-assisted surface topography evolution and the thickening of SiO2 layers that form on the unpassivated polysilicon surfaces and crack/notch faces. The differences in surface topography and oxide thickness are characterized as functions of fatigue cycling before discussing the micromechanisms of fatigue fracture.
Keywords :
atomic force microscopy; elemental semiconductors; fatigue; micromechanical devices; silicon; surface topography; MEMS structures; Si-SiO2; crack/notch faces; fatigue cycling; fatigue fracture; micromechanisms; oxide thickness; polysilicon; stress-assisted topography evolution; surface topography evolution; unpassivated surfaces; Fabrication; Fatigue; Manufacturing; Microelectromechanical devices; Microelectromechanical systems; Micromechanical devices; Resonant frequency; Silicon; Surface cracks; Surface topography;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2003.809957
Filename :
1203770
Link To Document :
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