• DocumentCode
    1219115
  • Title

    A Small Microwave Plasma Source for Long Column Production without Magnetic Field

  • Author

    Moisan, Michel ; Beaudry, Claude ; Leprince, Philippe

  • Author_Institution
    Département de Physique, Université de Montréal Montréal 101, Québec
  • Volume
    3
  • Issue
    2
  • fYear
    1975
  • fDate
    6/1/1975 12:00:00 AM
  • Firstpage
    55
  • Lastpage
    59
  • Abstract
    A new HF device is described. It allows the production, without the use of a magnetic field, of long plasma columns from a small HF coupling structure situated at one end of the column. Its operation is based on the propagation of a cold plasma surface wave. This device can work (in argon for example) at pressures from 2 mTorr to 20 Torr with electron densities from 1010 cm-3 to 1013 cm-3, depending on plasma diameter and HF power. Typically, 80W of 500 MHz HF will produce a 25 mn diameter column of 1.8 m length. The plasma is quiescent (low electron density fluctuations), efficient (~ 100% absorbed power), and perfectly reproducible. It can be used as a substitute for a positive column, and some practical applications are foreseen in ion production, laser excitation, gas preionization and spectroscopic sources.
  • Keywords
    Couplings; Electrons; Hafnium; Magnetic fields; Microwave devices; Plasma density; Plasma devices; Plasma sources; Plasma waves; Production;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.1975.4316875
  • Filename
    4316875