DocumentCode
1219115
Title
A Small Microwave Plasma Source for Long Column Production without Magnetic Field
Author
Moisan, Michel ; Beaudry, Claude ; Leprince, Philippe
Author_Institution
Département de Physique, Université de Montréal Montréal 101, Québec
Volume
3
Issue
2
fYear
1975
fDate
6/1/1975 12:00:00 AM
Firstpage
55
Lastpage
59
Abstract
A new HF device is described. It allows the production, without the use of a magnetic field, of long plasma columns from a small HF coupling structure situated at one end of the column. Its operation is based on the propagation of a cold plasma surface wave. This device can work (in argon for example) at pressures from 2 mTorr to 20 Torr with electron densities from 1010 cm-3 to 1013 cm-3, depending on plasma diameter and HF power. Typically, 80W of 500 MHz HF will produce a 25 mn diameter column of 1.8 m length. The plasma is quiescent (low electron density fluctuations), efficient (~ 100% absorbed power), and perfectly reproducible. It can be used as a substitute for a positive column, and some practical applications are foreseen in ion production, laser excitation, gas preionization and spectroscopic sources.
Keywords
Couplings; Electrons; Hafnium; Magnetic fields; Microwave devices; Plasma density; Plasma devices; Plasma sources; Plasma waves; Production;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.1975.4316875
Filename
4316875
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