DocumentCode :
1220291
Title :
Excess drain current in heterojunction FETs due to substrate space-charge-limited current
Author :
Tehrani, Saied ; Goronkin, Herb ; Hoogstra, Marjorie M. ; Maracas, George N. ; Curless, Jay A. ; Kramer, Gary D. ; Peffley, Marilyn S. ; Tsui, Raymond K.
Author_Institution :
Motorola Inc., Tempe, AZ, USA
Volume :
36
Issue :
9
fYear :
1989
fDate :
9/1/1989 12:00:00 AM
Firstpage :
1591
Lastpage :
1596
Abstract :
A comparison of gated and ungated heterostructure FETs shows that high output conductance, poor pinchoff, and kinks in the I-V characteristics of heterojunction FETs (HFETs) are related to space-charge-limited conduction (SCLC) associated with deep traps in the substrate. The dominant trap level was determined from I-V measurements of an ungated structure as a function of temperature and the trap density was determined from SCLC characteristics. Reduction in excess drain current can be achieved by using a high trap concentration substrate and by increasing the electron barrier between the channel and the substrate
Keywords :
field effect transistors; semiconductor device models; HFETs; I-V characteristics kinks; I-V measurements; SCLC; deep traps; dominant trap level; electron barrier; excess drain current; gated HFETs; heterojunction FETs; heterostructure FETs; high output conductance; high trap concentration substrate; models; poor pinchoff; space-charge-limited conduction; substrate space-charge-limited current; trap density; ungated HFETs; Buffer layers; Electron traps; FETs; Gallium arsenide; HEMTs; Heterojunctions; MESFETs; MODFETs; Temperature; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.34217
Filename :
34217
Link To Document :
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