• DocumentCode
    1221046
  • Title

    Frequency response of bipolar junction transistors after electron-beam irradiations

  • Author

    Jenkins, Keith A.

  • Author_Institution
    IBM Thomas J. Watson Res. Centre, Yorktown Heights, NY, USA
  • Volume
    36
  • Issue
    9
  • fYear
    1989
  • fDate
    9/1/1989 12:00:00 AM
  • Firstpage
    1722
  • Lastpage
    1724
  • Abstract
    The small-signal frequency response of silicon bipolar junction transistors was measured after the devices were irradiated with electrons below the displacement threshold. The measurements indicated that the high-frequency response of transistors is unchanged by electron irradiation, even though the low-frequency gain is degraded. Whereas process variations intended to change either the gain or cutoff frequency of transistors inevitably affect both, the electron-beam irradiation changes only the gain, giving a clear demonstration of the fact that the cutoff frequency is determined by the physical base transit time. As a practical consequence, the result implies that electron-beam irradiation has relatively little effect on circuit performance
  • Keywords
    bipolar transistors; electron beam effects; elemental semiconductors; radiation hardening (electronics); semiconductor technology; silicon; Si transistors; bipolar junction transistors; cutoff frequency; electron irradiation; electron-beam irradiations; high-frequency response; low-frequency gain; physical base transit time; semiconductors; small-signal frequency response; Bipolar transistors; Circuit testing; Current measurement; Cutoff frequency; Electron beams; Frequency measurement; Frequency response; Helium; Lithography; Modems;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.34234
  • Filename
    34234