DocumentCode
1221046
Title
Frequency response of bipolar junction transistors after electron-beam irradiations
Author
Jenkins, Keith A.
Author_Institution
IBM Thomas J. Watson Res. Centre, Yorktown Heights, NY, USA
Volume
36
Issue
9
fYear
1989
fDate
9/1/1989 12:00:00 AM
Firstpage
1722
Lastpage
1724
Abstract
The small-signal frequency response of silicon bipolar junction transistors was measured after the devices were irradiated with electrons below the displacement threshold. The measurements indicated that the high-frequency response of transistors is unchanged by electron irradiation, even though the low-frequency gain is degraded. Whereas process variations intended to change either the gain or cutoff frequency of transistors inevitably affect both, the electron-beam irradiation changes only the gain, giving a clear demonstration of the fact that the cutoff frequency is determined by the physical base transit time. As a practical consequence, the result implies that electron-beam irradiation has relatively little effect on circuit performance
Keywords
bipolar transistors; electron beam effects; elemental semiconductors; radiation hardening (electronics); semiconductor technology; silicon; Si transistors; bipolar junction transistors; cutoff frequency; electron irradiation; electron-beam irradiations; high-frequency response; low-frequency gain; physical base transit time; semiconductors; small-signal frequency response; Bipolar transistors; Circuit testing; Current measurement; Cutoff frequency; Electron beams; Frequency measurement; Frequency response; Helium; Lithography; Modems;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.34234
Filename
34234
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