DocumentCode :
1221285
Title :
Parasitic effects of surface states on GaAs MESFET characteristics at liquid-nitrogen temperature
Author :
Liang, C.L. ; Wong, H. ; Cheung, N.W. ; Sato, R.N.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Volume :
36
Issue :
9
fYear :
1989
fDate :
9/1/1989 12:00:00 AM
Firstpage :
1858
Lastpage :
1860
Abstract :
An abrupt increase of drain current has been observed at low drain voltages for GaAs MESFETs operated at liquid-nitrogen temperature. The drain voltage (Vk) at which the anomaly occurs shifts slightly toward smaller drain voltages with increasing gate voltage. Two types of I-V behavior exist for drain voltages less than Vk. For type I behavior, the devices show transistor-like characteristics with smaller drain output current and transconductance than expected. I-V characteristics similar to breakdown in short-channel devices are observed for drain voltages near Vk. For type II behavior, the devices show space-charge-limited current characteristics. In both cases, the drain current returns to the normal MESFET value when the drain voltage exceeds Vk. The phenomena can be explained by parasitic effects of surface states in the separation regions between the gate and the heavily doped drain/source
Keywords :
III-V semiconductors; Schottky gate field effect transistors; equivalent circuits; gallium arsenide; semiconductor device models; surface electron states; GaAs; I-V characteristics; III-V semiconductors; MESFET; distributed RC circuit model; drain current; drain voltages; heavily doped drain/source; liquid-nitrogen temperature; parasitic effects; space-charge-limited current characteristics; surface states; transconductance; transistor-like characteristics; Aircraft propulsion; Breakdown voltage; Electron devices; Electron traps; Gallium arsenide; Low voltage; MESFETs; Nitrogen; Temperature; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.34258
Filename :
34258
Link To Document :
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