Interface trap generation and hole trapping under NBTI and PBTI in advanced CMOS technology with a 2-nm gate oxide

This paper gives an insight into the degradation mechanisms during negative and positive bias temperature instabilities in advanced CMOS technology with a 2-nm gate oxide. We focus on generated interface traps and oxide traps to distinguish their dependencies and effects on usual transistor parameters. negative bias temperature instability (NBTI) and positive bias temperature instability in both NMOS and PMOS have been compared and a possible explanation for all configurations has been suggested. Recovery and temperature effect under NBTI were also investigated showing different behaviors of the two components.