Title :
III–V-N compounds for multi-junction solar cells on Si
Author :
Yamane, Keisaku ; Urakami, Noriyuki ; Sekiguchi, Hiroto ; Wakahara, Akihiro
Author_Institution :
Toyohashi Univ. of Technol., Toyohashi, Japan
Abstract :
We proposed a GaPN/GaAsPN/Si multi-junction solar cell in which lattice constants for all layers matched to Si bottom cell. Initial growth of GaP layer on Si is an important role to suppress the anti-phase domain, stacking faults, threading dislocations and melt-back etching. According to theoretical estimation considering the strain effect, band-gap energy about 1.65 eV can be obtained by GaAs0.2P0.74N0.06 which satisfies the lattice-matching condition to Si. In order to clarify the possibility of this material system, we grew GaPN and GaAsPN on the structural defect-free GaP/Si template by using rf-MBE. We also investigated the pinning state at the GaP(N)/Si heterointerface to design a low-loss tunneling junction.
Keywords :
III-V semiconductors; dislocations; elemental semiconductors; etching; gallium arsenide; phosphorus compounds; semiconductor growth; semiconductor junctions; silicon; solar cells; GaPN-GaAsPN-Si; III-V-N compounds; anti-phase domain; band-gap energy; heterointerface; lattice-matching condition; low-loss tunneling junction; melt-back etching; multijunction solar cells; rf-MBE; stacking faults; strain effect; structural defect-free template; threading dislocations; Annealing; Atomic layer deposition; Crystals; Indexes; Lead; Silicon; Voltage measurement; III–V-N alloy; III–V/Si; carrier lifetime; heteroepitaxy;
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location :
Denver, CO
DOI :
10.1109/PVSC.2014.6925509