DocumentCode :
122231
Title :
P+ layer effects on a-Si:H solar cell performance
Author :
Kibum Kim ; Yue Kuo
Author_Institution :
Thin Film Nano & Microelectron. Res. Lab., Texas A&M Univ., College Station, TX, USA
fYear :
2014
fDate :
8-13 June 2014
Firstpage :
3055
Lastpage :
3059
Abstract :
Influences of the p+ layer, i.e., deposition condition, post-deposition annealing, thin film deposition sequence, internal light reflection, electrode film quality, and SiNX chamber pretreatment on the a-Si:H solar cell performance have been studied. The conversion efficiency is improved using the pin stack structure with a high final annealing temperature and a high reflective bottom electrode due to the decrease of the contact resistance, the reduction of defects in the film, the increase of the hole transport efficiency, the improvement of light absorption, and the minimum cross contamination. The high solar cell efficiency was obtained by optimizing the p+ related film process.
Keywords :
annealing; contact resistance; hydrogen; light refraction; silicon compounds; solar cells; Si:H; SiNX; annealing temperature; chamber pretreatment; contact resistance; conversion efficiency; electrode film quality; hole transport efficiency; internal light reflection; light absorption; minimum cross contamination; p+ layer effects; pin stack structure; post-deposition annealing; reflective bottom electrode; solar cell performance; thin film deposition sequence; Absorption; Annealing; Current measurement; Hydrogen; Photovoltaic cells; Pollution measurement; ITO sheet resistance; PECVD; a-Si:H solar cell; chamber treatment; deposition sequence; light reflection; p+ deposition; post-deposition annealing; power conversion efficiency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location :
Denver, CO
Type :
conf
DOI :
10.1109/PVSC.2014.6925580
Filename :
6925580
Link To Document :
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