DocumentCode :
1222322
Title :
Shrinking possibilities
Author :
Arnold, Bill
Volume :
46
Issue :
4
fYear :
2009
fDate :
4/1/2009 12:00:00 AM
Lastpage :
56
Abstract :
Lithography will need multiple strategies to keep up with the evolution of memory and logic.
Keywords :
integrated circuit technology; integrated logic circuits; integrated memory circuits; lithography; EUV lithography; extreme ultraviolet lithography; lithography; logic evolution; memory evolution; optical lithography; semiconductor industry; Lithography; Logic;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.2009.4808761
Filename :
4808761
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1222322
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