• DocumentCode
    1223841
  • Title

    A possible explanation for high quantum efficiency of PtSi/porous Si Schottky detectors

  • Author

    Raissi, Farshid

  • Author_Institution
    Electr. Eng. Dept., K. N. Toosi Univ. of Technol., Tehran, Iran
  • Volume
    50
  • Issue
    4
  • fYear
    2003
  • fDate
    4/1/2003 12:00:00 AM
  • Firstpage
    1134
  • Lastpage
    1137
  • Abstract
    P-type PtSi/porous Si Schottky detectors exhibit efficiencies as large as 60% in 2 to 7 μm spectral range. Such efficiencies are larger than theoretical limit for regular PtSi detectors, as predicted by the modified Fowler theory. In the porous detectors a thin PtSi layer covers the walls of the pores creating a Schottky junction with a random surface orientation at any given point with respect to the Si substrate. If we assume that the orientation of the junction surface changes in scales comparable to the mean free path of the photo-excited carriers and incorporate that into the orthodox theory, the chance of transferring excited carriers into the Si substrate increases drastically and the large efficiencies of the porous samples can partially be justified.
  • Keywords
    Schottky diodes; elemental semiconductors; infrared detectors; platinum; porous semiconductors; silicon; 2 to 7 micron; Fowler theory; IR detectors; PtSi-Si; Schottky detectors; efficiencies; junction surface; mean free path; photo-excited carriers; porous detectors; quantum efficiency; random surface orientation; Avalanche breakdown; Breakdown voltage; Etching; Infrared detectors; Photoelectricity; Radiation detectors; Silicides; Substrates; Surface morphology; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.812087
  • Filename
    1206903