DocumentCode :
1225785
Title :
A 5- 
m-Thick SOI Waveguide With Low Birefringence and Low Roughness and Optical Interconnection Using High Numerical Aperture Fiber
Author :
Hsu, Shih-Hsiang
Author_Institution :
Dept. of Electron. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei
Volume :
20
Issue :
12
fYear :
2008
fDate :
6/15/2008 12:00:00 AM
Firstpage :
1003
Lastpage :
1005
Abstract :
A 5-m-thick silicon-on-insulator waveguide possessing low birefringence of and 9-nm lithography roughness is investigated using arrayed waveguide grating and an atomic force microscope. Instead of complex processing using a 3-D mode size converter, the high numerical aperture fiber is utilized as the bridge between the corresponding waveguide and single-mode fiber (SMF-28) to obtain a competitive coupling loss of 0.4 dB.
Keywords :
arrayed waveguide gratings; atomic force microscopy; birefringence; elemental semiconductors; optical interconnections; silicon; silicon-on-insulator; SOI waveguide; Si; arrayed waveguide grating; atomic force microscope; high numerical aperture fiber; low birefringence; low roughness; optical interconnection; silicon-on-insulator; size 5 mum; size 9 nm; Apertures; Arrayed waveguide gratings; Birefringence; Optical fiber devices; Optical fiber losses; Optical fiber polarization; Optical refraction; Optical waveguides; Page description languages; Stress; Optical waveguides; optical waveguide components; optoelectronic devices;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2008.923754
Filename :
4526729
Link To Document :
