Title :
Physical Science, Measurement and Instrumentation, Management and Education, IEE Proceedings A
Author :
Stevenson, J.T.M. ; Jordan, J.R.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Abstract :
Conventional methods of generating master grating patterns and replica gratings are described and the use of silicon as a substrate for metrological gratings is introduced. Optical displacement transducers based on a relative movement of a scale grating and an index grating are reviewed. The detection of misalignment between mask pattern and wafer in the fabrication of microcircuits is introduced as an important application.<>
Keywords :
diffraction gratings; displacement measurement; elemental semiconductors; integrated circuit testing; masks; moire fringes; optical workshop techniques; replica techniques; silicon; substrates; transducers; Si; displacement transducers; index grating; mask pattern; master grating patterns; metrological gratings; microcircuits; misalignment; moire fringe detection; replica gratings; scale grating; wafer;
Journal_Title :
Physical Science, Measurement and Instrumentation, Management and Education, IEE Proceedings A
