DocumentCode :
1226660
Title :
An investigation of the contact resistance of a commercial elastomer interconnect under thermal and mechanical stresses
Author :
Liu, Weifeng ; Lee, Mikyoung ; Pecht, Michael ; Martens, Rod
Author_Institution :
Hewlett-Packard, Roseville, CA, USA
Volume :
3
Issue :
2
fYear :
2003
fDate :
6/1/2003 12:00:00 AM
Firstpage :
39
Lastpage :
43
Abstract :
The contact behavior of a commercial elastomer interconnect, composed of silicone rubber and silver particles, was evaluated under thermal and mechanical stresses. Its contact resistance demonstrated a linear relationship in a log-log plot with contact force at room temperature; however, a deviation of the trend occurred when temperature was changed. With the interconnect compressed under a constant force, a fluctuation in contact resistance was initiated by a change of temperature. This phenomenon may be attributed to the inherent conduction mechanisms of the elastomer interconnect. The multiple interfaces between metal particles make the contact sensitive to a variety of factors. This sensitivity may have a direct impact on its long-term reliability.
Keywords :
contact resistance; elastomers; filled polymers; integrated circuit interconnections; integrated circuit reliability; particle reinforced composites; silicone rubber; silver; thermal stresses; Ag; commercial elastomer interconnect; contact force; contact resistance; inherent conduction mechanisms; linear relationship; log-log plot; long-term reliability; mechanical stresses; multiple interfaces; silicone rubber; silver particles; socket; thermal stresses; Contact resistance; Creep; Integrated circuit interconnections; Integrated circuit reliability; Rubber; Silver; Sockets; Temperature sensors; Thermal resistance; Thermal stresses;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2003.814262
Filename :
1208284
Link To Document :
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