• DocumentCode
    1227374
  • Title

    Simulation of the EUV spectrum of Xe and Sn plasmas

  • Author

    Sasaki, Akira ; Nishihara, Katsunobu ; Koike, Fumihiro ; Kagawa, Takashi ; Nishikawa, Takeshi ; Fujima, Kazumi ; Kawamura, Tohru ; Furukawa, Hiroyuki

  • Author_Institution
    Adv. Photon Res. Center, Japan Atomic Energy Res. Inst., Kyoto, Japan
  • Volume
    10
  • Issue
    6
  • fYear
    2004
  • Firstpage
    1307
  • Lastpage
    1314
  • Abstract
    Complex spectra of Xe and Sn, and their feasibility for use in the lithographic extreme ultraviolet (EUV) source, are investigated. By combining calculations of atomic data using the HULLAC code and the Whiam collisional radiative model with a simple radiative transfer model, the EUV spectrum is shown to originate from a large number of fine structure transitions. Satellite lines of 4d-4f and 4d-5p transitions from near ten times ionized states are found to make a significant contribution to the emission from an optically thick plasma. The wavelengths and transition probabilities of emission lines, charge state distribution, and level population in the plasma, as well as radiation intensity from a laser-produced plasma source have been calculated. The effect of opacity is taken into account assuming a local thermodynamic equilibrium population in the plasma. The calculated result reproduces the observed spectra both for Xe and Sn, showing applicability of the present method to the spectroscopy of hot dense plasmas.
  • Keywords
    opacity; plasma light propagation; plasma production by laser; plasma simulation; plasma sources; plasma temperature; plasma thermodynamics; radiative lifetimes; radiative transfer; tin; ultraviolet lithography; ultraviolet spectra; xenon; 4d-4f transitions; 4d-5p transitions; EUV spectrum; HULLAC code; Sn; Sn complex spectra; Sn plasma; Whiam collisional radiative model; Xe; Xe complex spectra; Xe plasma; atomic data calculations; charge state distribution; emission lines; fine structure transitions; hot dense plasma; ionized states; laser produced plasma source; level population; lithographic extreme ultraviolet source; local thermodynamic equilibrium population; opacity; optically thick plasma; plasma spectroscopy; radiative transfer model; satellite lines; transition probabilities; Atomic measurements; Plasma density; Plasma simulation; Plasma sources; Plasma waves; Probability; Satellites; Stimulated emission; Tin; Ultraviolet sources;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2004.838081
  • Filename
    1390907