DocumentCode :
1227374
Title :
Simulation of the EUV spectrum of Xe and Sn plasmas
Author :
Sasaki, Akira ; Nishihara, Katsunobu ; Koike, Fumihiro ; Kagawa, Takashi ; Nishikawa, Takeshi ; Fujima, Kazumi ; Kawamura, Tohru ; Furukawa, Hiroyuki
Author_Institution :
Adv. Photon Res. Center, Japan Atomic Energy Res. Inst., Kyoto, Japan
Volume :
10
Issue :
6
fYear :
2004
Firstpage :
1307
Lastpage :
1314
Abstract :
Complex spectra of Xe and Sn, and their feasibility for use in the lithographic extreme ultraviolet (EUV) source, are investigated. By combining calculations of atomic data using the HULLAC code and the Whiam collisional radiative model with a simple radiative transfer model, the EUV spectrum is shown to originate from a large number of fine structure transitions. Satellite lines of 4d-4f and 4d-5p transitions from near ten times ionized states are found to make a significant contribution to the emission from an optically thick plasma. The wavelengths and transition probabilities of emission lines, charge state distribution, and level population in the plasma, as well as radiation intensity from a laser-produced plasma source have been calculated. The effect of opacity is taken into account assuming a local thermodynamic equilibrium population in the plasma. The calculated result reproduces the observed spectra both for Xe and Sn, showing applicability of the present method to the spectroscopy of hot dense plasmas.
Keywords :
opacity; plasma light propagation; plasma production by laser; plasma simulation; plasma sources; plasma temperature; plasma thermodynamics; radiative lifetimes; radiative transfer; tin; ultraviolet lithography; ultraviolet spectra; xenon; 4d-4f transitions; 4d-5p transitions; EUV spectrum; HULLAC code; Sn; Sn complex spectra; Sn plasma; Whiam collisional radiative model; Xe; Xe complex spectra; Xe plasma; atomic data calculations; charge state distribution; emission lines; fine structure transitions; hot dense plasma; ionized states; laser produced plasma source; level population; lithographic extreme ultraviolet source; local thermodynamic equilibrium population; opacity; optically thick plasma; plasma spectroscopy; radiative transfer model; satellite lines; transition probabilities; Atomic measurements; Plasma density; Plasma simulation; Plasma sources; Plasma waves; Probability; Satellites; Stimulated emission; Tin; Ultraviolet sources;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2004.838081
Filename :
1390907
Link To Document :
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