DocumentCode
1228010
Title
GaN Substrates—Progress, Status, and Prospects
Author
Paskova, Tanya ; Evans, Keith R.
Author_Institution
Kyma Technol., Inc., Raleigh, NC, USA
Volume
15
Issue
4
fYear
2009
Firstpage
1041
Lastpage
1052
Abstract
Recent advances in the research, development, and commercial production of native GaN substrates with low defect density and high structural and optical quality have attracted a renewed interest in development of nitride devices based on native substrates. The still low yet rapidly increasing availability of native GaN substrates opens the full potential of GaN devices and has accelerated progress in the development of several electronic and optoelectronic devices. In this paper, progress in the primary competing growth techniques for producing native GaN substrates will be reviewed. The technological issues pertaining to faster scalability of GaN substrate production will be discussed. The current state-of-the-art substrate material properties and the future prospects for the growth approaches and substrate quality will be presented.
Keywords
III-V semiconductors; crystal defects; crystal growth from solution; gallium compounds; semiconductor growth; substrates; wide band gap semiconductors; GaN; defect density; full potential; growth techniques; native substrates; nitride devices; optical quality; optoelectronic devices; structural quality; substrate material; Ammonothermal growth; defects; dislocations; doping; gallium nitride (GaN); hydride vapor phase epitaxy; lattice matching; native substrates; solution growth; surface orientation; thermal conductivity;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2009.2015057
Filename
4811963
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