• DocumentCode
    1228010
  • Title

    GaN Substrates—Progress, Status, and Prospects

  • Author

    Paskova, Tanya ; Evans, Keith R.

  • Author_Institution
    Kyma Technol., Inc., Raleigh, NC, USA
  • Volume
    15
  • Issue
    4
  • fYear
    2009
  • Firstpage
    1041
  • Lastpage
    1052
  • Abstract
    Recent advances in the research, development, and commercial production of native GaN substrates with low defect density and high structural and optical quality have attracted a renewed interest in development of nitride devices based on native substrates. The still low yet rapidly increasing availability of native GaN substrates opens the full potential of GaN devices and has accelerated progress in the development of several electronic and optoelectronic devices. In this paper, progress in the primary competing growth techniques for producing native GaN substrates will be reviewed. The technological issues pertaining to faster scalability of GaN substrate production will be discussed. The current state-of-the-art substrate material properties and the future prospects for the growth approaches and substrate quality will be presented.
  • Keywords
    III-V semiconductors; crystal defects; crystal growth from solution; gallium compounds; semiconductor growth; substrates; wide band gap semiconductors; GaN; defect density; full potential; growth techniques; native substrates; nitride devices; optical quality; optoelectronic devices; structural quality; substrate material; Ammonothermal growth; defects; dislocations; doping; gallium nitride (GaN); hydride vapor phase epitaxy; lattice matching; native substrates; solution growth; surface orientation; thermal conductivity;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2009.2015057
  • Filename
    4811963