DocumentCode :
1228010
Title :
GaN Substrates—Progress, Status, and Prospects
Author :
Paskova, Tanya ; Evans, Keith R.
Author_Institution :
Kyma Technol., Inc., Raleigh, NC, USA
Volume :
15
Issue :
4
fYear :
2009
Firstpage :
1041
Lastpage :
1052
Abstract :
Recent advances in the research, development, and commercial production of native GaN substrates with low defect density and high structural and optical quality have attracted a renewed interest in development of nitride devices based on native substrates. The still low yet rapidly increasing availability of native GaN substrates opens the full potential of GaN devices and has accelerated progress in the development of several electronic and optoelectronic devices. In this paper, progress in the primary competing growth techniques for producing native GaN substrates will be reviewed. The technological issues pertaining to faster scalability of GaN substrate production will be discussed. The current state-of-the-art substrate material properties and the future prospects for the growth approaches and substrate quality will be presented.
Keywords :
III-V semiconductors; crystal defects; crystal growth from solution; gallium compounds; semiconductor growth; substrates; wide band gap semiconductors; GaN; defect density; full potential; growth techniques; native substrates; nitride devices; optical quality; optoelectronic devices; structural quality; substrate material; Ammonothermal growth; defects; dislocations; doping; gallium nitride (GaN); hydride vapor phase epitaxy; lattice matching; native substrates; solution growth; surface orientation; thermal conductivity;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2009.2015057
Filename :
4811963
Link To Document :
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