• DocumentCode
    1228254
  • Title

    On smoothing three-dimensional Monte Carlo ion implantation simulation results

  • Author

    Heitzinger, Clemens ; Hössinger, Andreas ; Selberherr, Siegfried

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. of Vienna, Austria
  • Volume
    22
  • Issue
    7
  • fYear
    2003
  • fDate
    7/1/2003 12:00:00 AM
  • Firstpage
    879
  • Lastpage
    883
  • Abstract
    An algorithm for smoothing results of three-dimensional (3-D) Monte Carlo ion implantation simulations and translating them from the grid used for the Monte Carlo simulation to an arbitrary unstructured 3-D grid is presented. This algorithm is important for joining various process simulation steps, where data have to be smoothed or transferred from one grid to another. Furthermore, it is important for integrating the ion implantation simulator into a process flow. One reason for using different grids is that for certain Monte Carlo simulation methods, using orthogrids is mandatory because of performance reasons. The algorithm presented sweeps a small rectangular grid over the points of the new tetrahedral grid and uses approximation by generalized Bernstein polynomials. This approach was put on a mathematically sound basis by proving several properties of these polynomials. It does not suffer from the adverse effects of least squares fits of polynomials of fixed degree as known from the response surface method. The most important properties of Bernstein polynomials generalized to cuboid domains are presented, including uniform convergence, an asymptotic formula, and the variation diminishing property. The smoothing algorithm which works very fast is described and, in order to show its applicability, the resulting values of a 3-D real world implantation example are given and compared with those of a least squares fit of a multivariate polynomial of degree two, which yielded unusable results.
  • Keywords
    Monte Carlo methods; ion implantation; polynomial approximation; semiconductor process modelling; smoothing methods; 3-D CMOS structure; arbitrary unstructured 3-D grid; asymptotic formula; cuboid domains; generalized Bernstein polynomial approximation; orthogrids; process flow; process simulation steps; small rectangular grid; smoothing algorithm; tetrahedral grid; three-dimensional Monte Carlo ion implantation simulation; uniform convergence; variation diminishing property; Application software; Approximation algorithms; Convergence; Integrated circuit yield; Ion implantation; Least squares approximation; Least squares methods; Monte Carlo methods; Polynomials; Smoothing methods;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.2003.814259
  • Filename
    1208447