Title :
Advanced lithography for ULSI
Author :
Bokor, J. ; Neureuther, A.R. ; Oldham, W.G.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fDate :
1/1/1996 12:00:00 AM
Abstract :
Lens technology has advanced to the point where lithographic feature sizes equal to, or even smaller than, the wavelength of the light used in the stepper can be achieved in production. How far optical lithography can go from here depends both on how short a wavelength is possible and how close we can come to the absolute limit of diffraction. In this article, we will examine the current thinking on these questions, and discuss what might happen if and when optical lithography really can no longer be used
Keywords :
ULSI; integrated circuit technology; lenses; lithography; ULSI; absolute limit of diffraction; lens technology; lithographic feature sizes; optical lithography; stepper; Focusing; High speed optical techniques; Lenses; Lithography; Optical computing; Optical diffraction; Optical interferometry; Production; Resists; Ultra large scale integration;
Journal_Title :
Circuits and Devices Magazine, IEEE
