• DocumentCode
    1228858
  • Title

    A Statistical Reliability Model for Single-Electron Threshold Logic

  • Author

    Chen, Chunhong ; Mao, Yanjie

  • Author_Institution
    Dept. of Electr. & Comput. Engi neering, Univ. of Windsor, Windsor, ON
  • Volume
    55
  • Issue
    6
  • fYear
    2008
  • fDate
    6/1/2008 12:00:00 AM
  • Firstpage
    1547
  • Lastpage
    1553
  • Abstract
    As one of the most promising candidates for future digital circuit applications, single-electron tunneling (SET) technology has been used to ensure further feature size reduction and ultralow power dissipation. However, this technology raises very serious concerns about reliable functioning, particularly due to random background charges and tight fabrication tolerances. Accurate evaluation of reliability for SET circuits has thus become a crucial step toward their reliability analysis and improvement. This brief proposes a statistical reliability model for SET logic gates, which takes into account the actual process variations and input probabilities. In particular, we study two typical SET logic gates (two-input nor and nand gates) for gate reliability evaluation. Instead of assuming a constant failure rate for logic gates as in most previous work, we show how logic inputs affect the reliability of the individual gates with discussions on the overall reliability of the system consisting of logic gates. This model can be used in future computer-aided design tools to estimate tunneling events, energy consumption, and reliability of SET-based digital logic circuits.
  • Keywords
    CAD; circuit reliability; electronic engineering computing; logic gates; single electron devices; threshold logic; SET logic gates; computer-aided design tools; digital circuit applications; digital logic circuits; energy consumption; reliable functioning; single-electron threshold logic; single-electron tunneling; statistical reliability model; tight fabrication tolerances; tunneling events; ultralow power dissipation; CMOS logic circuits; CMOS technology; Logic circuits; Logic devices; Logic gates; Nanoscale devices; Power dissipation; Redundancy; Semiconductor device modeling; Tunneling; Nanoelectronics; reliability modeling; single-electron devices; threshold logic gates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.922856
  • Filename
    4527051