Title :
Density Determination of Silicon Spheres Using an Interferometer With Optical Frequency Tuning
Author :
Kuramoto, Naoki ; Fujii, Kenichi ; Azuma, Yasushi ; Mizushima, Shigeki ; Toyoshima, Yasutake
Author_Institution :
National Metrol. Inst. of Japan, National Inst. of Adv. Ind. Sci. & Technol., Tsukuba
fDate :
4/1/2007 12:00:00 AM
Abstract :
An absolute density measurement was performed for two 1-kg silicon spheres, which were named S4 and S5. The volumes of the spheres were measured by an interferometer equipped with a direct optical frequency tuning system. Thicknesses of the oxide layer on the surfaces of the spheres were measured by using an ellipsometer to evaluate its effect on their volumes. The accuracy of the ellipsometric measurements was evaluated using silicon disks characterized by X-ray reflectometry and X-ray photoelectron spectroscopy. The masses of the spheres were compared with that of the national prototype of the kilogram through a secondary 1-kg standard. The relative combined standard uncertainty in the density was estimated to be 3.4 10-8 to 3.7 10-8
Keywords :
density measurement; ellipsometers; light interferometers; mass measurement; measurement standards; measurement uncertainty; optical tuning; silicon; volume measurement; 1 kg; Si; X-ray photoelectron spectroscopy; X-ray reflectometry; absolute density measurement; density determination; direct optical frequency tuning system; ellipsometric measurements; interferometer; oxide layer; silicon disks; silicon spheres; standard uncertainty; Density measurement; Frequency measurement; Optical interferometry; Optical tuning; Performance evaluation; Reflectometry; Silicon; Spectroscopy; Thickness measurement; Volume measurement; Avogadro´s constant; X-ray crystal density method; X-ray photoelectron spectroscopy (XPS); X-ray reflectometry (XRR); ellipsometry; interferometry; optical frequency tuning; silicon crystal;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
DOI :
10.1109/TIM.2007.890616
