DocumentCode
1232307
Title
Finite-element determination of interconnect track overheating
Author
O´Neill, A.G.
Author_Institution
Dept. of Electr. & Electron. Eng., Newcastle upon Tyne Univ., UK
Volume
25
Issue
22
fYear
1989
Firstpage
1484
Lastpage
1485
Abstract
In the design of new processes for VLSI, track overheating as a result of resistive losses must be well characterised to avoid problems such as electromigration. The finite-element analysis presented demonstrates serious shortcomings in the usual thermal resistor model for estimating overheating. For a minimum feature size of 1 mu m, track overheating may be 5 times greater than estimated when designs are realised.
Keywords
VLSI; finite element analysis; 1 micron; VLSI; electromigration; finite-element analysis; interconnect track overheating; resistive losses; thermal resistor model;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19890995
Filename
35148
Link To Document