• DocumentCode
    1232307
  • Title

    Finite-element determination of interconnect track overheating

  • Author

    O´Neill, A.G.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Newcastle upon Tyne Univ., UK
  • Volume
    25
  • Issue
    22
  • fYear
    1989
  • Firstpage
    1484
  • Lastpage
    1485
  • Abstract
    In the design of new processes for VLSI, track overheating as a result of resistive losses must be well characterised to avoid problems such as electromigration. The finite-element analysis presented demonstrates serious shortcomings in the usual thermal resistor model for estimating overheating. For a minimum feature size of 1 mu m, track overheating may be 5 times greater than estimated when designs are realised.
  • Keywords
    VLSI; finite element analysis; 1 micron; VLSI; electromigration; finite-element analysis; interconnect track overheating; resistive losses; thermal resistor model;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19890995
  • Filename
    35148