Title :
Finite-element determination of interconnect track overheating
Author_Institution :
Dept. of Electr. & Electron. Eng., Newcastle upon Tyne Univ., UK
Abstract :
In the design of new processes for VLSI, track overheating as a result of resistive losses must be well characterised to avoid problems such as electromigration. The finite-element analysis presented demonstrates serious shortcomings in the usual thermal resistor model for estimating overheating. For a minimum feature size of 1 mu m, track overheating may be 5 times greater than estimated when designs are realised.
Keywords :
VLSI; finite element analysis; 1 micron; VLSI; electromigration; finite-element analysis; interconnect track overheating; resistive losses; thermal resistor model;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19890995