Title :
Optical channel waveguides in silicon diffused from GeSi alloy
Author :
Schuppert, B. ; Petermann, K.
Author_Institution :
Inst. fur Hochfrequenztech., Tech. Univ. Berlin, West Germany
Abstract :
A technique for fabricating low-loss and polarisation-independent channel waveguides in silicon is reported. The waveguides are obtained by Ge-indiffusion using either a GeSi alloy or a system of alternating Ge and Si layers. Typical fabrication parameters for single-mode waveguides are given.
Keywords :
Ge-Si alloys; diffusion in solids; optical waveguides; optical workshop techniques; semiconductor materials; Ge-Si alternating layers; Ge-indiffusion; GeSi alloy; channel waveguides; fabrication parameters; low-loss; optical waveguides; polarisation-independent; semiconductors; single-mode waveguides;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19891007
