Title :
Process extensions in optical lithography enabling 45-nm technologies
Author :
Zandbergen, Peter ; Van Steenwinckel, David ; Lammers, Jeroen H. ; Kwinten, Hans ; Juffermans, Casper
Author_Institution :
Philips Res., Leuven, Belgium
Abstract :
This work describes approaches in the field of process extensions, complementary to the more traditional optical extension techniques, to enable the extension of optical lithography to 45-nm technologies.
Keywords :
masks; nanolithography; nanopatterning; photoresists; 193 nm; 193-nm lithography scanners; 45 nm; 45-nm technologies; chemical contrast; chemically amplified resists; conventional binary mask technology; gate patterning; optical extension; optical lithography; photo resists; process extension; CMOS technology; Chemical processes; Chemical technology; Focusing; Lithography; Optical films; Optical imaging; Paper technology; Production; Resists;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2004.841755
