DocumentCode :
1233583
Title :
Analysis of CMOS Photodiodes. I. Quantum efficiency
Author :
Lee, Ji Soo ; Hornsey, Richard I. ; Renshaw, David
Author_Institution :
Univ. of Waterloo, Ont., Canada
Volume :
50
Issue :
5
fYear :
2003
fDate :
5/1/2003 12:00:00 AM
Firstpage :
1233
Lastpage :
1238
Abstract :
An improved one-dimensional (1-D) analysis of the CMOS photodiode has been derived in which the effect of the substrate, which forms a high-low junction with the epitaxial layer, has been included. The analytical solution was verified with numerical simulations based on parameters extracted from a standard 0.35 μm CMOS process. Two empirical parameters are suggested to offset the unavoidable inaccuracies in the extracted parameter values. The derived semiempirical expression exhibits a good agreement with the measured spectral response. In Part II of this paper, a three-dimensional (3-D) analysis of lateral photoresponse in CMOS photodiode arrays is presented along with an empirical modeling method utilizing test linear photodiode arrays.
Keywords :
CMOS image sensors; photodiodes; semiconductor device models; 0.35 micron; APS; CMOS image sensor; CMOS photodiode; active pixel sensor; edge-effect; epitaxial layer; high-low junction; lateral diffusion; lateral photoresponse; numerical simulations; quantum efficiency; spectral response; CMOS image sensors; CMOS technology; Crosstalk; Epitaxial layers; Numerical simulation; Photodiodes; Pixel; Semiconductor device modeling; Space technology; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.813232
Filename :
1210767
Link To Document :
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