DocumentCode :
1234263
Title :
Scaling and technological limitations of 1/f noise and oscillator phase noise in SiGe HBTs
Author :
Niu, Guofu ; Tang, Jin ; Feng, Zhiming ; Joseph, Alvin J. ; Harame, David L.
Author_Institution :
Electr. & Comput. Eng. Dept., Auburn Univ., AL
Volume :
53
Issue :
2
fYear :
2005
Firstpage :
506
Lastpage :
514
Abstract :
This paper examines the impact of SiGe HBT scaling on 1/f noise and phase noise of oscillators and frequency synthesizers. The increase of transistor speed with scaling is shown to significantly increase the sensitivity of oscillation frequency to 1/f noise and, thus, degrade close-in phase noise, but decrease the sensitivity of oscillation frequency to base current shot noise and base resistance thermal noises. The results show that corner offset frequency defined by the intersect of the 1/f3 and 1/f2 phase noise has little to do with the traditional 1/f corner frequency. The relative importance of individual noise sources in determining phase noise is examined as a function of technology scaling, device sizing, and oscillation frequency. The collector current shot noise and base resistance noise are shown to set the fundamental limits of phase noise reduction. A methodology to identify the maximum tolerable 1/f K factor is established and demonstrated for the HBTs used
Keywords :
1/f noise; Ge-Si alloys; frequency synthesizers; heterojunction bipolar transistors; phase noise; semiconductor device noise; semiconductor materials; sensitivity; shot noise; thermal noise; 1/f corner frequency; 1/f noise; SiGe; SiGe HBT scaling; base current shot noise; base resistance noise; base resistance thermal noise; close-in phase noise; collector current shot noise; corner offset frequency; device sizing; frequency synthesizers; oscillation frequency; oscillator phase noise; phase noise reduction; sensitivity; technology scaling; transistor speed; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Noise figure; Noise reduction; Oscillators; Phase noise; Semiconductor device noise; Silicon germanium; Thermal resistance; Corner frequency; SiGe HBT; cyclostationary noise; phase noise; upconversion;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2004.840768
Filename :
1393192
Link To Document :
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