Oxidation behavior of AlN in the presence of oxide and glass for thick film applications

Author

Yamaguchi, Takashi ; Kageyama, Makiko

Author_Institution

Fac. of Sci. & Technol., Keio Univ., Yokohama, Japan

Volume

12

Issue

3

fYear

1989

fDate

9/1/1989 12:00:00 AM

Firstpage

402

Lastpage

405

Abstract

The effect of oxides and oxide glasses on the oxidation of AlN powder and substrate was studied by thermogravimetric analysis, supplemented by XRD, optical microscopy, and EPMA. The oxidation behavior of powder mixtures of AlN and oxides or glass frits in air was dependent on the oxide species. Oxides were divided into three groups: PbO, CuO, and Bi₂O₃ promoted the oxidation drastically, ZnO and MgO enhanced the oxidation slightly, and B₂O₃ retarded the oxidation of AlN. SiO₂ and Al₂O₃ had no influence on the oxidation. Also reported is a study of the interactions between the AlN substrate and PbO-containing glasses

Keywords

aluminium compounds; materials testing; oxidation; substrates; thick film circuits; Al₂O₃; AlN powder oxidation; AlN-Al₂O₃; AlN-B₂O₃; AlN-Bi₂O₃; AlN-CuO; AlN-MgO; AlN-PbO; AlN-SiO₂; AlN-ZnO; B₂O₃; Bi₂O₃; CuO; EPMA; MgO; PbO; SiO₂; TGA; XRD; ZnO; glass frits; optical microscopy; oxidation behavior; oxidation enhancement; oxidation retardation; oxides; thermogravimetric analysis; thick film applications; thick film technology; Glass; Isothermal processes; Oxidation; Powders; Pressure control; Substrates; Temperature distribution; Thick films; Water heating; X-ray scattering;

fLanguage

English

Journal_Title

Components, Hybrids, and Manufacturing Technology, IEEE Transactions on

Publisher

ieee

ISSN

0148-6411

Type

jour

DOI

10.1109/33.35489

Filename

35489