DocumentCode :
1237322
Title :
SiGe/Si Quantum-Dot Infrared Photodetectors With {bm \\delta } Doping
Author :
Lin, Chu-Hsuan ; Yu, Cheng-Ya ; Chang, Chieh-Chun ; Lee, Cheng-Han ; Yang, Ying-Jhe ; Ho, Wei Shuo ; Chen, Yen-Yu ; Liao, Ming Han ; Cho, Chia-Ting ; Peng, Cheng-Yi ; Liu, CheeWee
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei
Volume :
7
Issue :
5
fYear :
2008
Firstpage :
558
Lastpage :
564
Abstract :
The multicolor absorption of MOS SiGe/Si quantum-dot (QD) infrared photodetectors is demonstrated using the boron delta-doping in Si spacers. The energy-dispersive X-ray spectroscopy shows that the Ge concentration in the wetting layers is much smaller than that in QDs. Most holes stay at the ground state in QDs instead of wetting layers. The energy band structure in QDs is calculated to understand the absorption spectrum. The absorption at 3.7-6 mum is due to the intersubband transition in the SiGe QDs. The other absorption at 6-16 mu m mainly comes from the intraband transition in the boron delta-doping wells. Since the broadband spectrum covers most of the atmospheric transmission windows for infrared, the broadband detection is feasible using this device.
Keywords :
Ge-Si alloys; MIS structures; X-ray chemical analysis; band structure; infrared detectors; photodetectors; semiconductor doping; semiconductor heterojunctions; semiconductor materials; semiconductor quantum dots; SiGe-Si; boron delta-doping; energy band structure; energy-dispersive X-ray spectroscopy; multicolor absorption; quantum-dot infrared photodetectors; $delta$ doping; Delta doping; MOS; QDIP; Quantum dots; SiGe; quantum dots (QDs); quantum-dot infrared photodetector (QDIP);
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2008.926353
Filename :
4531959
Link To Document :
بازگشت