• DocumentCode
    1237532
  • Title

    Two-layer dielectric microstrip line structure: SiO2 on Si and GaAs on Si: modeling and measurement

  • Author

    Lawton, R.A. ; Anderson, Wallace T.

  • Author_Institution
    NBS, Boulder, CO, USA
  • Volume
    36
  • Issue
    4
  • fYear
    1988
  • fDate
    4/1/1988 12:00:00 AM
  • Firstpage
    785
  • Lastpage
    789
  • Abstract
    Further development is reported of the modeling of the two-layer dielectric microstrip line structure by computing the scattering parameter S21 derived from the model and comparing the computed value with the measured value over the frequency range from 90 MHz to 18 GHz. The sensitivity of the phase of S21, and the magnitude of the characteristic impedance to various parameters of the equivalent circuit is also discussed. Examples are given of the measurement and modeling of the SiO 2 on silicon system to 18 GHz and the modeling of the GaAs on silicon system to 100 GHz
  • Keywords
    III-V semiconductors; S-parameters; electric impedance; elemental semiconductors; equivalent circuits; gallium arsenide; semiconductor devices; silicon; silicon compounds; strip lines; waveguide theory; 90 MHz to 100 GHz; GaAs-Si; SiO2-Si; characteristic impedance; dielectric microstrip line structure; equivalent circuit; scattering parameter; semiconductors; two layer structure; Anisotropic magnetoresistance; Dielectric measurements; Gallium arsenide; Geometrical optics; Gyrotropism; Microstrip; Optical films; Optical propagation; Optical waveguides; Polarization;
  • fLanguage
    English
  • Journal_Title
    Microwave Theory and Techniques, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9480
  • Type

    jour

  • DOI
    10.1109/22.3591
  • Filename
    3591