DocumentCode
1237532
Title
Two-layer dielectric microstrip line structure: SiO2 on Si and GaAs on Si: modeling and measurement
Author
Lawton, R.A. ; Anderson, Wallace T.
Author_Institution
NBS, Boulder, CO, USA
Volume
36
Issue
4
fYear
1988
fDate
4/1/1988 12:00:00 AM
Firstpage
785
Lastpage
789
Abstract
Further development is reported of the modeling of the two-layer dielectric microstrip line structure by computing the scattering parameter S 21 derived from the model and comparing the computed value with the measured value over the frequency range from 90 MHz to 18 GHz. The sensitivity of the phase of S 21, and the magnitude of the characteristic impedance to various parameters of the equivalent circuit is also discussed. Examples are given of the measurement and modeling of the SiO 2 on silicon system to 18 GHz and the modeling of the GaAs on silicon system to 100 GHz
Keywords
III-V semiconductors; S-parameters; electric impedance; elemental semiconductors; equivalent circuits; gallium arsenide; semiconductor devices; silicon; silicon compounds; strip lines; waveguide theory; 90 MHz to 100 GHz; GaAs-Si; SiO2-Si; characteristic impedance; dielectric microstrip line structure; equivalent circuit; scattering parameter; semiconductors; two layer structure; Anisotropic magnetoresistance; Dielectric measurements; Gallium arsenide; Geometrical optics; Gyrotropism; Microstrip; Optical films; Optical propagation; Optical waveguides; Polarization;
fLanguage
English
Journal_Title
Microwave Theory and Techniques, IEEE Transactions on
Publisher
ieee
ISSN
0018-9480
Type
jour
DOI
10.1109/22.3591
Filename
3591
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