DocumentCode
1239047
Title
Graphical analysis of contact resistance
Author
Adlerstein, M.G.
Author_Institution
Res. Div., Raytheon Co., Lexington, MA
Volume
31
Issue
3
fYear
1995
fDate
2/2/1995 12:00:00 AM
Firstpage
238
Lastpage
239
Abstract
Low contact resistance is a recognised advantage for high performance semiconductor devices. This translates to requirements for semiconductor layers with low sheet resistivity and metallisations with low specific contact resistance. The present a graphical interpretation of the importance of these requirements and illustrate the analysis for various semiconductor materials
Keywords
contact resistance; semiconductor device metallisation; semiconductor devices; semiconductor-metal boundaries; contact resistance; graphical analysis; metallisation; semiconductor devices;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
Filename
362620
Link To Document