Fabricating low-loss hollow optical waveguides via amorphous silicon bonding using dilute KOH solvent

Author

Lo, Shih-Shou ; Chiu, Hua-Kung ; Chen, Chii-Chang ; Hsu, Shih-Chieh ; Liu, Cheng-Yi

Author_Institution

Inst. of Opt. Sci., Nat. Central Univ., Jhong-Li, Taiwan

Volume

17

Issue

12

fYear

2005

Firstpage

2592

Lastpage

2594

Abstract

This work explicates a method for fabricating a hollow optical waveguide. Dilute KOH solvent was used to bond two omni-directional reflector (ODR) Si wafers to an amorphous Si thin film on the top of a Si wafer. The resultant bonding interface is very thin, with a thickness that is close to that of a SiO₂ layer in the ODR substrate. Therefore, the far field image reveals that light is strongly confined in the hollow optical waveguide.

Keywords

amorphous semiconductors; elemental semiconductors; mirrors; optical fabrication; optical losses; optical waveguides; semiconductor thin films; silicon; wafer bonding; KOH; Si; Si thin film; Si wafers; amorphous silicon bonding; amorphous thin film; bonding interface; dilute KOH solvent; far field image; hollow optical waveguide; low-loss optical waveguides; omnidirectional reflector; optical waveguide fabrication; wafer bonding; Amorphous silicon; Hollow waveguides; Optical films; Optical sensors; Optical waveguides; Plasma temperature; Propagation losses; Semiconductor thin films; Solvents; Wafer bonding; Bonding; hollow; optical waveguide; wafer bonding;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2005.859137

Filename

1542159